Case of Great Wall Development Technology Electronic Device Purification Project
Cleanliness Class:Class 100
Construction method:EPC
Project address:Guangdong
Customer introduction:A gallium oxide semiconductor single crystal material ultra-clean plant project in Hangzhou. After the completion of the project, it will be the first professional production line of gallium oxide single crystal substrates and epitaxial wafers in China.Gallium oxide, as a representative of the fourth generation semiconductor materials, can meet the needs of high-voltage and high-power devices in electric vehicle, photovoltaic inverters, high-speed rail transmission and other fields, as well as the material needs of RF devices in 5G communication field.
Project Product:Semiconductor single crystal material
Nature of the enterprise:Industry famous enterprises
Project address:Hangzhou, Zhejiang
Project name:Semiconductor single crystal material ultra-clean plant engineering
Industry category:Semiconductor single crystal material
Cleanliness Class:Class 1000,Class 10000
Project content: 1、Constant temperature and humidity environment system
2、Interior works
3、Intelligent and Automatic Control System Project
4、Heating, ventilation and electrical engineering
5、process cooling water
6、RO/DI reverse osmosis, compressed air
7、More.....
Purification project case shot, only part of the picture is shown.







